SAN JOSE, Calif.--(BUSINESS WIRE)--AVACO, an equipment manufacturer that currently specializes in the sputtering (PVD) vacuum deposition equipment for flat panel display (FPD) and solar production, now expands its expertise into the atomic layer deposition (ALD) process. Today, AVACO announced its innovative horizontal in-line modular atomic layer deposition (ALD) system for solar cell and other large-substrate process.
AVACO’s ALD system is an innovative system for large-substrates, offering an optimized design with advanced capabilities that dramatically shorten cycle times and lower the cost of ownership. The first shipment of the tool was delivered to a leading R&D facility in Asia, Q3 of 2013.
AVACO’s new ALD process system can provide enhanced energy conversion efficiency solution through innovative buffer layer deposition process for solar cell. For more information please visit us at our Booth #751, Solar Power International (SPI) 2013 – Chicago, or visit our website at www.avaco.co.kr/eng.
"AVACO’s new ALD system for solar cell is another example of AVACO’s commitment to support our customers worldwide with next-generation tools and state-of-the-art process solutions for current technology needs,” said Chuck Kim, business development director of AVACO. "Developing new and innovative systems that exceed our customer’s requirement allow AVACO to continue to penetrate into our new target market on a global scale.”
About AVACO CO. LTD:
AVACO, a publicly traded company headquartered in Daegu, South Korea (KOSDAQ: 083930), is a global supplier of thin-film processing equipment and specializes in the manufacture of sputtering (PVD) vacuum deposition equipment (in-line, cluster, and roll to roll type), atomic layer deposition (ALD) equipment, various BEOL equipment, and factory automation equipment such as clean stocker, clean crane, and overhead transfer system for large-scale substrate.
AVACO is known for delivering proven mass production manufacturing equipment that encompasses all aspects related to thin-film coating such as TCO, metal electrode, and dielectric layer. Target materials used for AVACO’s sputtering system includes Ag, AGZO, Al, Al2O3, AlNd, AZO, CIGS, Cr, Cu, CuGa, CuIn, GZO, IGZO, In, ITO, IZO, Mo, MoTi, MoW, Ni, Se, SiO2, TiO2, ZnO and others with DC, pulsed-DC, and MF utilizing single or dual magnetron source.