LONDON--(BUSINESS WIRE)--According to the latest market study released by Technavio, the global semiconductor photolithography equipment market is projected to grow to USD 8.19 billion by 2021, at a CAGR of more than 9% over the forecast period.
This research report titled ‘Global Semiconductor Photolithography Equipment Market 2017-2021’ provides an in-depth analysis of the market in terms of revenue and emerging market trends. This market research report also includes up to date analysis and forecasts for various market segments and all geographical regions.
| Semiconductor lithography, also called semiconductor photolithography, is a method of fabrication of printed circuit boards (PCBs) and microprocessors. It transfers a circuit image to a silicon wafer by exposing both silicon wafer and photomask to ultraviolet light and then projects the circuit image on the wafer. The shorter replacement cycles for electronic devices is a key factor driving the market growth. |
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Based on the light source, the report categorizes the global semiconductor photolithography equipment market into the following segments:
- Excimer laser
- Mercury lamp
- Fluorine laser
Excimer laser
“The excimer laser segment occupied nearly half of the semiconductor photolithography market in 2016, and is expected to grow faster than the other segments over the forecast period,” says Jujhar Singh, a lead analyst at Technavio for semiconductor equipment research.
Excimer lasers are extensively used in high-resolution photolithography machines used for microelectronic chip manufacturing. Current photolithography tools use deep UV light from KrF and ArF excimer lasers with wavelengths of 248 and 193 nanometers. This light source is mainly useful in the manufacturing of microelectronic devices like ICs or chips.
Mercury lamp
The semiconductor lithography market by mercury lamps is projected to grow to USD 1.75 billion by the end of 2017 and will continue to grow swiftly over the forecast period. Initially, photolithography has used the UV light from gas discharge lamps using mercury or noble gases such as xenon. From the early 1960s through the mid-1980s, mercury lamps dominated the photolithography market and were used for their spectral lines at 436 nm, 405 nm, and 365 nm. However, the semiconductor industry’s need for higher resolutions has decreased the dependence on mercury lamp-based lithography tools.
Fluorine laser
“The 157 nm fluorine laser is expected to be the next big step in photolithography due to this laser’s ability to produce high amounts of energy per photon,” says Jujhar.
Although fluorine laser produces high amounts of energy, it emits only monochromatic radiations at 157.6 nm, and its non-tunability in the UV range is a serious drawback for its use. This market segment is expected to grow moderately over the forecast period due to this drawback.
The top vendors highlighted by Technavio’s research analysts in this report are:
- Applied Materials
- ASML
- Canon
- Tokyo Electron (TEL)
Browse Related Reports:
- Global Semiconductor Silicon Wafer Market 2017-2021
- Global Semiconductor Assembly Equipment Market 2017-2021
- Global Photomask Market 2017-2021
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