Business Wire
Welcome
  • Log In
  • Sign Up
Search News:
Help
http://www.leti.fr/
October 19, 2010 09:02 AM Eastern Daylight Time 

CEA-Leti Demonstrates First Single-Impulse Active 3D Imaging Matrix Operating At Infrared Frequency

GRENOBLE, France--(BUSINESS WIRE)--CEA-Leti said today it has demonstrated the first single-impulse active 3D imaging matrix operating at infrared frequency capable of returning a three-dimensional image of a distant object with a spatial resolution of 30cm from a single-laser flash, providing excellent stealth.

The infrared-active 3D imaging matrix, with a format of 320x256, currently operates at a wavelength of 1.55 microns for reasons of eye safety, but is also capable of operating with infrared lasers at wavelengths up to five microns.

The infrared-active 3D imaging matrix combines two major technical innovations developed by CEA-Leti.

The first innovation is the manufacture of an avalanche photodiode matrix created in the HgCdTe semiconductor. These extremely fast avalanche photodiodes operating in the nanosecond range have exceptional characteristics that imitate those of a perfect amplifier. They are capable of obtaining very high gains (in excess of 100) at low polarization voltages (less than 10 volts), without any excessive noise.

The second innovation is the design and manufacture of a read-out circuit based on a highly original concept patented by CEA-Leti that combines a time-of-flight measurement with a three-dimensional radiometric acquisition.

The results stem from Leti’s partnership with Sofradir, the European leader in developing and manufacturing advanced infrared detectors and holder of an exclusive license of CEA-Leti technology for this line of components for military, space, industrial and scientific applications

Their collaboration, which helps consolidate Sofradir’s position as an international leader in infrared, is carried out within the framework of a joint laboratory (DEFIR) and supported by CEA, Sofradir, DGA and Onera.

Leti presented these research results at the SPIE Defense, Security and Sensing conference in Orlando, Fla., earlier this year.

About CEA-Leti

CEA is a French research and technology public organisation, with activities in four main areas: energy, information technologies, healthcare technologies and defence and security. Within CEA, the Laboratory for Electronics & Information Technology (CEA-Leti) works with companies in order to increase their competitiveness through technological innovation and transfers. CEA-Leti is focused on micro and nanotechnologies and their applications, from wireless devices and systems, to biology and healthcare or photonics. Nanoelectronics and microsystems (MEMS) are at the core of its activities. As a major player in MINATEC campus, CEA-Leti operates 8,000-m² state-of-the-art clean rooms, on 24/7 mode, on 200mm and 300mm wafer standards. With 1,200 employees, CEA-Leti trains more than 150 Ph.D. students and hosts 200 assignees from partner companies. Strongly committed to the creation of value for the industry, CEA-Leti puts a strong emphasis on intellectual property and owns more than 1,500 patent families.
For more information, visit www.leti.fr.

Contacts

CEA-Leti
Thierry Bosc
+33 4 38 78 31 95
thierry.bosc@cea.fr
or
Agency for CEA-Leti
Amélie Ravier
+33 1 58 18 59 30
raviera@loomisgroup.com
or
Agency for Sofradir
Andrew Lloyd & Associates
Carol Leslie
+33 9 52 20 16 16
carol@ala.com

Recent Stories from CEA-Leti

  • View Press Release
    CEA-Leti and Caltech Alliance for Nanosystems VLSI Announce First Startup
    December 13, 2011
    PARIS--(BUSINESS WIRE)--Leti and Caltech today announce the launch of the first startup to emerge from their Alliance for Nanosystems VLSI. APIX will use an innovative system of miniaturized chroma... more »
  • View Press Release
    JSR Micro Joins CEA-Leti in Project to Develop Sub-20nm Next-Generation Lithography Materials and Processes
    October 19, 2011
    LEUVEN, Belgium & GRENOBLE, France--(BUSINESS WIRE)--Leti and JSR Micro today announced a partnership to develop sub-20nm next-gen lithography materials and processes in the frame of the three-year... more »
  • View Press Release
    Synopsys Joins CEA-Leti’s IMAGINE Program on Maskless Lithography
    September 19, 2011
    GRENOBLE, France--(BUSINESS WIRE)--Leti today announced that Synopsys has joined the IMAGINE program designed to develop maskless lithography for IC manufacturing. more »
More Stories
RSS feed for CEA-Leti
http://www.leti.fr/

Release Versions

  • EON: Enhanced Online News

Company Information Center

CEA-Leti RSS feed for CEA-Leti

Share

  • Facebook
  • Twitter
  • LinkedIn
  • Delicious
  • Reddit
  • StumbleUpon
  • Digg
  • MySpace
  • Newsvine
  • Google Bookmark
  • Yahoo! Bookmark
  • EmailEmail
Tweet
  • EmailEmail
All News
Business Wire
  • Home
    • Home
    • Membership Benefits
    • Submit a Press Release
  • News
    • All News
    • News with Multimedia
    • News by Industry
    • News by Subject
    • News by Language
    • RSS Feeds
    • Business Wire Mobile
    • Features
    • Company NewsCenters
    • Company Profiles
    • Annual Reports
  • Events
    • Trade Shows & Events
    • Earnings & Conference Calls
    • Business Wire Events
  • PR Services
    • Press Release Distribution
    • Distribution Lists
    • Industry Targeting
    • LatinoWire & Ethnic Media
    • Public Policy Wire
    • Trade Show Services
    • Photos & Multimedia Marketing
    • GloMoSoMe
    • Press Release Measurement
    • Mobile Alerts
    • Clips & Research
    • Fax & Email Services
    • Online Newsrooms
    • News Feeds
  • IR Services
    • Material News Disclosure
    • XBRL
    • EDGAR (US)
    • IPO Services
    • SEDAR (Canada)
    • European Disclosure
    • Corporate Social Responsibility (CSR)
    • Investor Targeting
    • Fax & Email Services
    • Online Investor Centers
    • IR Resource Center
  • SEO Services
    • Press Release Optimization
    • EON: Enhanced Online News
    • Webinars & Resources
  • Journalist Tools
    • PressPass: Your News
    • Conduct Surveys
    • Business Wire News Feeds
    • Business Wire News On Your Website
    • Journalism Associations
  • Support & Education
    • FAQ
    • How to Write a Press Release
    • How To Optimize a Press Release for Search
    • How to Distribute a Press Release
    • Find Your News Online
    • Sample Press Release
    • Features News Tips
    • International Media Tips
    • SEC Regulations
    • Exchange Guidelines
    • White Papers
    • Webinars & Podcasts
    • Get WiredIn!
  • About Us
    • Business Wire Newsroom
    • Contact Us
    • History
    • Jobs
  • About Us
  • Contact Us
  • Site Map
  • Privacy Statement
  • Terms of Use
  • ©2012 Business Wire

More Business Wire sites

  • Canada
  • UK/Ireland
  • Deutschland
  • France
  • Italy
  • Japan
  • EON: Enhanced Online News
  • Tradeshownews.com
  • PYMNTS.com

About Us

  • Business Wire Newsroom
  • Contact Us
  • Business Wired blog

News on BusinessWire.com

  • All News
  • RSS Feeds
  • Business Wire Mobile Apps

Follow Us on Twitter

  • @BusinessWire
  • @BWSportsWire
  • @BWPolitics
  • @BWCSRNews
  • @EONpr
  • @TradeshowNews
  • @BW_Canada
  • @BWIntlMedia
  • @BWInfoDiva
  • @BusinessWireFR
  • @BWLatinoWire

Like Us on Facebook

  • Business Wire
  • Tradeshow News