Business Wire
Welcome
  • Log In
  • Sign Up
Search News:
Help
http://www.leti.fr/
July 19, 2010 10:48 AM Eastern Daylight Time 

CEA-Leti: Wear-a-BAN – Unobtrusive Wearable Human to Machine Wireless Interface

GRENOBLE, France--(BUSINESS WIRE)--Communication between man and machine, also known as Human-Machine-Interface (HMI), could become more intuitive or natural by integrating motional and emotional information, parameters which are difficult to express with standard HMI devices. Indeed, in man to man communication, a large part of the information is transmitted naturally through non-verbal communication (body language, intonations, etc). Such a paradigm shift requires a move from classical computer peripherals towards natural interfaces that mimic the natural human interaction. With recent advances in microelectronics, embedded signal processing and software technologies, more natural HMI solutions are within reach, which will enable new gaming, medical rehabilitation and robotics interfacing paradigms and require very short and intuitive learning curves for anyone.

The objective of the Wear-a-BAN project (Unobtrusive wearable human to machine wireless interface) is to investigate and demonstrate ultra low-power wireless body-area-network technologies for enabling unobtrusive human to machine interfaces into market segments such as smart and interactive textiles, robotics for augmented reality assistance and rehabilitation and natural interfacing devices for video gaming.

The kick-off meeting of the Wear-a-BAN project was held on the 23-24th June in Limasol, Cyprus and the project was successfully launched with the active participation of the consortium members. The project will last for two years and the consortium consists of leading research organizations, universities, Associations of SMEs and SME participants from all over Europe, including the Robotics Society of Finland, Cap Digital Paris Region, Ateval, Playall Management, Ramon Espi S.L., Movea SA, Deltatron Oy, SignalGeneriX Ltd., Voxler, Aitex, CSEM SA, Technical University of Berlin, VTT, CEA-Leti and the coordinator RTD TALOS Ltd.

About CEA-Leti

CEA is a French research and technology public organisation, with activities in four main areas: energy, information technologies, healthcare technologies and defence and security. Within CEA, the Laboratory for Electronics & Information Technology (CEA-Leti) works with companies in order to increase their competitiveness through technological innovation and transfers. CEA-Leti is focused on micro and nanotechnologies and their applications, from wireless devices and systems, to biology and healthcare or photonics. Nanoelectronics and microsystems (MEMS) are at the core of its activities. As a major player in MINATEC campus, CEA-Leti operates 8,000-m² state-of-the-art clean rooms, on 24/7 mode, on 200mm and 300mm wafer standards. With 1,200 employees, CEA-Leti trains more than 150 Ph.D. students and hosts 200 assignees from partner companies. Strongly committed to the creation of value for the industry, CEA-Leti puts a strong emphasis on intellectual property and owns more than 1,500 patent families.
For more information, visit www.leti.fr.

Contacts

CEA-Leti
Thierry Bosc
+33 4 38 78 31 95
thierry.bosc@cea.fr

Agency
Amélie Ravier
+33 158 18 59 30
raviera@loomisgroup.com

Recent Stories from CEA-Leti

  • View Press Release
    CEA-Leti and Caltech Alliance for Nanosystems VLSI Announce First Startup
    December 13, 2011
    PARIS--(BUSINESS WIRE)--Leti and Caltech today announce the launch of the first startup to emerge from their Alliance for Nanosystems VLSI. APIX will use an innovative system of miniaturized chroma... more »
  • View Press Release
    JSR Micro Joins CEA-Leti in Project to Develop Sub-20nm Next-Generation Lithography Materials and Processes
    October 19, 2011
    LEUVEN, Belgium & GRENOBLE, France--(BUSINESS WIRE)--Leti and JSR Micro today announced a partnership to develop sub-20nm next-gen lithography materials and processes in the frame of the three-year... more »
  • View Press Release
    Synopsys Joins CEA-Leti’s IMAGINE Program on Maskless Lithography
    September 19, 2011
    GRENOBLE, France--(BUSINESS WIRE)--Leti today announced that Synopsys has joined the IMAGINE program designed to develop maskless lithography for IC manufacturing. more »
More Stories
RSS feed for CEA-Leti
http://www.leti.fr/

Release Versions

  • EON: Enhanced Online News

Company Information Center

CEA-Leti RSS feed for CEA-Leti

Share

  • Facebook
  • Twitter
  • LinkedIn
  • Delicious
  • Reddit
  • StumbleUpon
  • Digg
  • MySpace
  • Newsvine
  • Google Bookmark
  • Yahoo! Bookmark
  • EmailEmail
Tweet
  • EmailEmail
All News
Business Wire
  • Home
    • Home
    • Membership Benefits
    • Submit a Press Release
  • News
    • All News
    • News with Multimedia
    • News by Industry
    • News by Subject
    • News by Language
    • RSS Feeds
    • Business Wire Mobile
    • Features
    • Company NewsCenters
    • Company Profiles
    • Annual Reports
  • Events
    • Trade Shows & Events
    • Earnings & Conference Calls
    • Business Wire Events
  • PR Services
    • Press Release Distribution
    • Distribution Lists
    • Industry Targeting
    • LatinoWire & Ethnic Media
    • Public Policy Wire
    • Trade Show Services
    • Photos & Multimedia Marketing
    • GloMoSoMe
    • Press Release Measurement
    • Mobile Alerts
    • Clips & Research
    • Fax & Email Services
    • Online Newsrooms
    • News Feeds
  • IR Services
    • Material News Disclosure
    • XBRL
    • EDGAR (US)
    • IPO Services
    • SEDAR (Canada)
    • European Disclosure
    • Corporate Social Responsibility (CSR)
    • Investor Targeting
    • Fax & Email Services
    • Online Investor Centers
    • IR Resource Center
  • SEO Services
    • Press Release Optimization
    • EON: Enhanced Online News
    • Webinars & Resources
  • Journalist Tools
    • PressPass: Your News
    • Conduct Surveys
    • Business Wire News Feeds
    • Business Wire News On Your Website
    • Journalism Associations
  • Support & Education
    • FAQ
    • How to Write a Press Release
    • How To Optimize a Press Release for Search
    • How to Distribute a Press Release
    • Find Your News Online
    • Sample Press Release
    • Features News Tips
    • International Media Tips
    • SEC Regulations
    • Exchange Guidelines
    • White Papers
    • Webinars & Podcasts
    • Get WiredIn!
  • About Us
    • Business Wire Newsroom
    • Contact Us
    • History
    • Jobs
  • About Us
  • Contact Us
  • Site Map
  • Privacy Statement
  • Terms of Use
  • ©2012 Business Wire

More Business Wire sites

  • Canada
  • UK/Ireland
  • Deutschland
  • France
  • Italy
  • Japan
  • EON: Enhanced Online News
  • Tradeshownews.com
  • PYMNTS.com

About Us

  • Business Wire Newsroom
  • Contact Us
  • Business Wired blog

News on BusinessWire.com

  • All News
  • RSS Feeds
  • Business Wire Mobile Apps

Follow Us on Twitter

  • @BusinessWire
  • @BWSportsWire
  • @BWPolitics
  • @BWCSRNews
  • @EONpr
  • @TradeshowNews
  • @BW_Canada
  • @BWIntlMedia
  • @BWInfoDiva
  • @BusinessWireFR
  • @BWLatinoWire

Like Us on Facebook

  • Business Wire
  • Tradeshow News