OYAMA, Japan--(BUSINESS WIRE)--Gigaphoton Inc., a major lithography light source manufacturer, announced today that it succeeded in twenty-four hour continuous operation and stable emission of an extreme ultraviolet (EUV) light source scanner, a laser-produced plasma (LPP) light source prototype device that it is currently developing, at an output of 108W, with an average energy stability of no greater than 0.5%.
This achievement builds on further advances in key technologies developed by Gigaphoton, such as Droplet Generators capable of producing droplets 20 microns or smaller in diameter, solid-state pre-pulse laser and main pulse carbon dioxide (CO2) laser combinations, debris mitigation technology using magnetic fields, and energy control technologies. Gigaphoton plans to start operating a high-output test unit by the end of 2015, to achieve 250W levels, a target needed for mass manufacturing applications such as memory devices moving forward.
Vice-president and CTO of Gigaphoton, Hakaru Mizoguchi, had the following to say. “Our ability to succeed with continuous operation for twenty-four hours at an output of 108W indicates that we are close to completing an EUV light source that can operate stably with low running costs and high output, which is what semiconductor manufacturers are looking for. In addition to this news, Gigaphoton’s EUV light sources are in use at the EUVL Infrastructure Development Center (EIDEC) as EUV irradiators in use as part of the EUV Resistance Outgassing Control Program. These irradiators are contributing to the development of EUV resistance. This development effort toward superior technological skill and mass production on the part of Gigaphoton is helping us to accelerate our work on the EUV scanner. Not only am I certain that when we bring it to market we will herald the next generation of exposure technology, I am also confident that it will help us to improve semiconductor performance, and contribute epochal results to the growth of the industry as a new core technology that will support information technologies such as the Internet of Things (IoT).”
More on this advance as well as information on the latest in EUV light source development will be announced at SEMICON Japan 2015, to be held from December 16th through the 18th at Tokyo Big Site.
NB: This milestone was achieved as part of a program subsidized by the New Energy and Industrial Technology Development Organization (NEDO).
Since its founding in 2000, Gigaphoton has been developing and supplying user-friendly, high-performance, deep ultraviolet (DUV) laser light sources for leading semiconductor manufacturers throughout Asia, the US and Europe.
Gigaphoton is working to play a leading role in developing cost-effective EUV scanners for mass production, with its focus on LPP EUV solutions that utilize groundbreaking technologies through the use of our numerous patents. Gigaphoton is working to be the number one supplier in the world of excellent lithography light sources. Always focusing on the needs of the end users, we aim for the best reliability in the world and for customer support that meets global standards in all areas from research and development through manufacturing. For more information, please visit http://www.gigaphoton.com/en.