AUSTIN, Texas--(BUSINESS WIRE)--Tanner EDA, a division of Tanner Research, Inc. has made a technology contribution to Si2’s OpenPDK Coalition which allows for Open Process Specification (OPS) information to be mapped into the OpenAccess database.
Historically, EDA vendors have developed proprietary methods to store process-related information about integrated circuit designs. It has been a goal of Si2’s Open Process Design Kit (OpenPDK) Coalition to produce a reference implementation based on and demonstrating the OpenPDK emerging standards. With the Tanner EDA technology contribution, a standard means for storing process data—specifically database resolution layer, purpose, material, and display information—can be demonstrated, allowing the OPS Working Group to continue progress in bringing real-world OpenPDK use cases and examples to the industry.
“PDK engineers and developers will now have a fully documented API, reference libraries, and translators to help implement the OPS standard in their environment,” says John Zuk, Vice President, Tanner EDA. “The API will be directly accessible from C++, Python, Ruby, Tcl, and Perl. Likewise, the translators will be able to access data in the OPS XML format while translating in and out of the OpenAccess Technology Database, namely oaTechDB.”
As the Tanner EDA OpenPDK Technology Contribution has been made to the OpenPDK Coalition, all of the coalition members in good standing have access. The overarching goal of the OpenPDK Coalition is to develop a set of open standards defining a PDK structure that is portable between foundries and as agnostic to specific EDA tools as possible. OpenPDK standards from Si2 enable greater efficiency in PDK development, verification and delivery, and will provide equivalent support to all foundries, EDA tool vendors, IP providers, and end users alike. The OpenPDK standards aim to support all process nodes, including high-voltage analog processes. For more information, see: http://www.si2.org/?page=1118.
OpenPDK Member Companies
AnaGlobe Technology, Cadence Design Systems (NASDAQ: CDNS), GLOBALFOUNDRIES, IBM (NYSE: IBM), Intel (NASDAQ: INTC), Mentor Graphics (NASDAQ: MENT), NXP (NASDAQ: NXPI), Samsung Electronics (KSE: 005930), Silvaco, STMicroelectronics (NYSE: STM), Synopsys (NASDAQ: SNPS), and Tanner EDA.
About Tanner EDA
Tanner EDA provides a complete line of software solutions that drive innovation for the design, layout and verification of analog and mixed-signal (A/MS) integrated circuits (ICs) and MEMS. Customers are creating breakthrough applications in areas such as power management, displays and imaging, automotive, consumer electronics, life sciences, and RF devices. A low learning curve, high interoperability, and a powerful user interface improve design team productivity and enable a low total cost of ownership (TCO). Capability and performance are matched by low support requirements and high support capability as well as an ecosystem of partners that bring advanced capabilities to A/MS designs.
Founded in 1988, Tanner EDA solutions deliver just the right mixture of features, functionality and usability. The company has shipped over 33,000 licenses of its software to more than 5,000 customers in 67 countries.
Si2 is the largest organization of industry-leading semiconductor, systems, EDA and manufacturing companies focused on the development and adoption of standards to improve the way integrated circuits are designed and manufactured, in order to speed time-to market, reduce costs, and meet the challenges of sub-micron design. Now in its 26th year, Si2 is uniquely positioned to enable timely collaboration through dedicated staff and a strong implementation focus driven by its member companies. Si2 represents over 100 companies involved in all parts of the silicon supply chain throughout the world. See www.si2.org
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