Molecular Imprints Announces the Sale and Shipment of an Imprio® 250
MII Places First NGL System at a Leading Semiconductor Memory Manufacturer
AUSTIN, Texas--(BUSINESS WIRE)--Molecular Imprints, Inc. (MII), the leader in nano-imprint lithography announces the shipment of an Imprio® 250 for Next Generation Lithography (NGL) to a leading semiconductor memory manufacturer. MII’s Step and Flash Imprint Lithography (S-FIL™) technology replicates the ultra high resolution of e-beam lithography with the low cost of ownership of optical lithography to provide a manufacturing solution that can be extended through multiple technology generations. The expected initial use of the system will be process development and device prototyping at 32nm and below.
“We believe MII’s S-FIL technology is an ideal complement to 193i optical lithography for critical layer applications at the 32nm generation and a complete solution at 22nm.”
“MII has made tremendous progress over the last 12 months to provide an NGL solution to the semiconductor industry. This tool sale is a clear validation of our progress,” said Mark Melliar-Smith, CEO of Molecular Imprints. “We believe MII’s S-FIL technology is an ideal complement to 193i optical lithography for critical layer applications at the 32nm generation and a complete solution at 22nm.”
The continued growth of the 270 billion dollar semiconductor industry relies upon advances in lithography, a six billion dollar capital equipment market. This represents a significant growth opportunity for MII as the semiconductor industry progresses per “Moore’s Law” to the finer resolution requirements of its next generation devices. In addition to semiconductor applications, MII’s high resolution and low cost S-FIL technology is gaining broader market acceptance by enabling advances in high performance hard disk drives (HDD) and light emitting diodes (LED), which further validates the capability and value of MII’s Imprio products.
About Molecular Imprints Inc.
Molecular Imprints, Inc. (MII) develops and manufactures nano-imprint lithography systems for high resolution and 3-dimensional pattern replication. The company has commercialized a proprietary step-and-flash imprint lithography (S-FIL™) technology, which is a room temperature, low pressure, drop-on-demand, non-contact imprint process that has demonstrated sub-20 nanometer resolution. Molecular Imprints provides lithography systems using S-FIL technology that enable leading edge manufacturing of nanotechnology, solid state lighting, semiconductors, micro optical components, and magnetic data storage device. For more information, visit www.molecularimprints.com.