RASIRC Selected by SEMI as Technology Innovation Showcase Winner; Ultra Pure Steam Generation to Preview at SEMICON West
SEMI created the TIS program to provide a platform for highlighting innovative companies, inventors and entrepreneurs by exposing their innovations to a broad audience of semiconductor manufacturers, suppliers and investors. Participation was open to anyone with a solution to a real industry problem, including individual inventors, start-ups, academia, research institutions and large companies. Innovations and applications submitted for consideration in the competition were reviewed by judges using a strict set of criteria, including technical merit as well as relevance and significance to the semiconductor and related industries.
RASIRC's technology has many applications in the semiconductor and related industries. Ultra high purity steam controls the humidity in a cleanroom. Steam is commonly used as the source gas for generating oxide films on semiconductor wafers in diffusion and rapid thermal processing. Next generation films used in atomic layer deposition (nanotechnology) will require ultra pure steam for formation of the high K layer. Ultra high purity steam can also effectively remove contaminants from next generation structures. As device feature sizes continue to shrink and aspect ratios increase, the ability to get sufficient energy into the bottom of the trench becomes less and less efficient with megasonics. Steam provides high energy and excellent contaminant removal capability, so is well poised to become the cleaning process of choice for next generation wafer cleaning. In addition, the move to immersion lithography will require water that is absolutely pure and bubble free.
"Our selection as a Technology Innovation Showcase winner is a testament to the vision and engineering capabilities of our RASIRC team and confirms our belief in the importance and need for safe, effective and cost efficient delivery of ultra pure liquids and gases in the semiconductor, as well as other, industries," said Jeffrey Spiegelman, founder and president of RASIRC.
The SEMICON West exposition has been held annually since 1972 and attracted about 44,000 industry registrants in 2005. The exposition continues to be the global communication platform for the worldwide semiconductor equipment and materials industry.
SEMI is a global industry association serving companies that provide equipment, materials and services used to manufacture semiconductors, displays, nano-scaled structures, micro-electromechanical systems (MEMS) and related technologies. For more information, visit www.semi.org.
RASIRC was established March 7, 2005 to develop products that purify and deliver ultra pure liquids and gases, with a primary focus on water vapor. While steam is used extensively in the semiconductor industry, RASIRC technology is the first to purify live steam to generate ultra high purity (UHP) steam. Starting with de-ionized water and using specialized membranes to reduce total metals to less than 10 parts per trillion, this technology reduces cost, improves yield and dramatically improves safety. The UHP steam generated by RASIRC products is of critical importance for many applications in the semiconductor, pharmaceutical, medical, biological, fuel cell and power industries. For more information, contact Jeffrey Spiegelman at 858-259-1220, e-mail email@example.com or visit the website at www.rasirc.com.