JMAR to Showcase BriteLight(TM) Laser at Photonics West 2006 Conference

Photonics West 2006 Conference
SAN DIEGO--(BUSINESS WIRE)--Jan. 18, 2006--JMAR Technologies, Inc. (NASDAQ: JMAR) is showcasing its BriteLight(TM) DPSS Laser System at the Photonics West 2006 Conference from January 21 to 26, 2006 at the San Jose Convention Center in San Jose, CA.

The BriteLight(TM) System is a high-performance laser source for researchers and engineers in academic, homeland security, military and manufacturing settings requiring either a single specialized laser or a versatile laser system capable of future augmentation. This system, developed as the foundation for JMAR's Collimated Plasma Lithography (CPL) X-ray source, also provides the X-ray light source for JMAR's Compact X-ray Microscope. BriteLight(TM) technology is also the basis for JMAR's research into laser-induced breakdown spectroscopy (LIBS) for remote detection of hazardous materials in the field, supported by a SBIR contract from the U.S. Army.

“The BriteLight's flexible and modular design allows for unique customization which makes it a very attractive system for a wide range of research, security and manufacturing applications requiring a state-of-the-art DPSS laser system.”

"Photonics West 2006 provides an excellent opportunity to showcase the capabilities of our BriteLight(TM) laser technology to our targeted customer base," stated Ulf Westblom, VP of Marketing, Photonics Products. "The BriteLight's flexible and modular design allows for unique customization which makes it a very attractive system for a wide range of research, security and manufacturing applications requiring a state-of-the-art DPSS laser system."

JMAR recently announced its entrance into BriteLight(TM) representation and sales agreements with LOT-Oriel, covering Europe, with Lastek, covering Australia and with SP Systec, covering South Korea.

Sponsored by the Society of Photo-Optical Instrumentation Engineers ("SPIE"), Photonics West 2006 is North America's largest commercial exhibition on optics, lasers, biomedical optics, optoelectronic components, and imaging technologies, and brings together over 800 exhibitors from around the globe. More information on Photonics West 2006 can be found by visiting the Conference's website at

Interested attendees may also learn more about the BriteLight(TM) Laser product line at JMAR's booth, # 6310, located in the South Hall.

About BriteLight(TM)

JMAR's BriteLight(TM) DPSS Laser System offers a unique combination of high brightness, short pulse duration, and exceptional beam quality in a modular, compact design. The product offers research scientists and manufacturing engineers a versatile laser source that can be used for a multitude of applications, including spectro-chemical analysis, nanotech scale fabrication, X-ray microscopy and X-ray source generation.

About JMAR

JMAR Technologies, Inc. is a leading innovator in the development of laser-based equipment for imaging, analysis and fabrication at the nano-scale. The Company is leveraging over a decade of laser and photonics research to develop a diverse portfolio of products with commercial applications in rapidly growing industries while continuing to carry out research and development for the U.S. Defense Advanced Research Projects Agency (DARPA) and support for the U.S. Government's Defense Microelectronics Activity (DMEA) semiconductor fabrication facility. JMAR is targeting the nanotechnology, bioscience and semiconductor industries with its BriteLight(TM) Laser; X-ray Light Source; Compact X-ray Microscope - for 3D visualization of single cells and polymers; and its X-ray Nano Probe - enabling interaction, analysis and materials modification at the nano-scale. JMAR also develops, manufactures and markets its BioSentry(TM) microorganism early warning system and maintains a strategic alliance for the production of the READ chemical sensor for homeland security, environmental and utility infrastructure industries.

This news release contains certain "forward-looking statements." Forward-looking statements are based on current expectations and assumptions and are inherently subject to risks and uncertainties, some of which cannot be predicted or quantified, and many of which are beyond the Company's control. Actual results could differ materially from these forward-looking statements as a result of a number of factors, including the risk that the performance validation tests of the BioSentry Beta units are not successfully completed due to unforeseen issues with the installation and operation of the units outside of the controlled environment of JMAR's facility, delays in completion of the X-ray Microscope and X-ray Nano Probe prototypes and transition to production units, the failure of the technology to perform as predicted, competition from alternative technologies, uncertainties as to the size of the markets , cost and margins for JMAR's products, failure to obtain market acceptance, current or future government regulations affecting the use of JMAR's products, the lack of availability of critical components, the degree of protection from future patents, other risks associated with the development or acquisition of new products or technologies and those risks detailed in the Company's Form 10-Q for the quarter ended September 30, 2005 and its Form 8-K filed on March 30, 2005 with the SEC. Given these risks and uncertainties, investors are cautioned not to place undue reliance on such forward-looking statements and no assurances can be given that such statements will be achieved. JMAR Technologies, Inc. does not assume any duty to publicly update or revise the material contained herein.


JMAR Technologies, Inc.
Dennis E. Valentine, 858-946-6800
IR/Media Relations:
The Investor Relations Group
John Nesbett or Erika Moran, 212-825-3210

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