JMAR Technologies Expands BriteLight(TM) Laser Sales and Marketing Presence Worldwide; Company Enters into Agreement for BriteLight(TM) DPSS Laser Product Line Sales Representation in Australia, Europe, and South Korea

SAN DIEGO--(BUSINESS WIRE)--Dec. 21, 2005--JMAR Technologies, Inc. (Nasdaq: JMAR) has entered into representation and sales agreements with LOT-Oriel, Lastek Pty, and SP SYSTEC, Ltd, located in Germany, Australia and South Korea, respectively, for representation of the Company's diode pumped high power BriteLight(TM) Laser product line.

Under the terms of the agreements, JMAR's BriteLight laser product line will be marketed, sold, and supported in each region by its respective representative. LOT-Oriel will also represent the BriteLight(TM) product line in Northern Europe, Italy and Spain.

“The fact that the University chose BriteLight as its source not only validates JMAR's expertise in DPSS laser technology, but illustrates the versatility and high performance of the BriteLight product line as well.”

"Establishing an international sales network is an important part of JMAR's strategy to broaden the market for its photonics products," said JMAR's VP of Marketing for Photonics, Ulf Westblom. "We are very pleased to have found appropriate representation in these markets and look forward to successful relationships with our new associates."

While completing the contract with SP SYSTEC, Ltd. in Korea, Westblom had the opportunity to visit a BriteLight customer at the Wonkwang University in Ixxan to see, first hand, the BriteLight system being employed in an X-ray microscope application. "The success of X-ray microscopy is dependent on the quality and reliability of its light source", commented Westblom. "The fact that the University chose BriteLight as its source not only validates JMAR's expertise in DPSS laser technology, but illustrates the versatility and high performance of the BriteLight product line as well."

"By aligning with LOT-Oriel, Lastek Pty, and SP SYSTEC, Ltd, JMAR has achieved two important goals," stated Ron Walrod, JMAR's Chief Executive Officer. "We have significantly increased the geographic scope of our addressable market. Additionally, we have added new channels through which we will identify new BriteLight applications that can be leveraged across our other geographic markets."

The BriteLight(TM) system, developed as the foundation for JMAR's Collimated Plasma Lithography (CPL) X-ray source, also provides the X-ray light source for JMAR's Compact X-ray Microscope, currently in development. BriteLight technology is also the basis for JMAR research into laser-induced breakdown spectroscopy (LIBS) for remote detection of hazardous materials in the field, supported by a SBIR Grant from the U.S. Army.

About BriteLight(TM)

JMAR's BriteLight(TM) solid state laser system provides a unique combination of high brightness, short pulse duration, and exceptional beam quality in a modular, compact design. The product also offers research scientists and manufacturing engineers a versatile laser source that can be used for a multitude of applications, including spectro-chemical analysis, nanotech scale fabrication, microscopy and soft X-ray source generation.

About JMAR

JMAR Technologies, Inc. is a leading innovator in the development of laser-based equipment for imaging, analysis and fabrication at the nano-scale. The Company is leveraging over a decade of laser and photonics research to develop a diverse portfolio of products with commercial applications in rapidly growing industries while continuing to carry out research and development for the U.S. Defense Advanced Research Projects Agency (DARPA) and support for the U.S. Government's Defense Microelectronics Activity (DMEA) semiconductor fabrication facility. JMAR is targeting the nanotechnology, bioscience and semiconductor industries with its BriteLight(TM) Laser; X-ray Light Source; Compact X-ray Microscope - for 3D visualization of single cells and polymers; and its X-ray Nano Probe - enabling interaction, analysis and materials modification at the nano-scale. JMAR also develops, manufactures and markets its BioSentry(TM) microorganism contamination warning system and maintains a strategic alliance for the production of the READ chemical sensor for homeland security, environmental and utility infrastructure industries.

This news release contains certain "forward-looking statements." Forward-looking statements are based on current expectations and assumptions and are inherently subject to risks and uncertainties, some of which cannot be predicted or quantified, and many of which are beyond the Company's control. Actual results could differ materially from these forward-looking statements as a result of a number of factors, including the risk that the performance validation tests of the BioSentry Beta units are not successfully completed due to unforeseen issues with the installation and operation of the units outside of the controlled environment of JMAR's facility, delays in completion of prototypes and transition to production units, the failure of the technology to perform as predicted, competition from alternative technologies, uncertainties as to the size of the markets , cost and margins for JMAR's products, failure to obtain market acceptance, current or future government regulations affecting the use of JMAR's products, the lack of availability of critical components, the degree of protection from future patents, other risks associated with the development or acquisition of new products or technologies and those risks detailed in the Company's Form 10-Q for the quarter ended September 30, 2005 and its Form 8-K filed on March 30, 2005 with the SEC. Given these risks and uncertainties, investors are cautioned not to place undue reliance on such forward-looking statements and no assurances can be given that such statements will be achieved. JMAR Technologies, Inc. does not assume any duty to publicly update or revise the material contained herein.


JMAR Technologies, Inc.
Dennis E. Valentine, 858-946-6800
The Investor Relations Group
IR/Media Relations
John Nesbett or Erika Moran, 212-825-3210

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