TEL and IMEC Extend Lithography Collaboration to EUV and Hyper NA 193nm Immersion Lithography
Building on the success of past and present collaborations, TEL is to extend its partnership with IMEC by contributing an industry leading photoresist coater/developer system for use in IMEC's Industrial Affiliation Program on EUV lithography. This program will start in January 2006 and run for three years.
EUV lithography is widely expected to become the successor to 193nm immersion lithography in advanced patterning techniques, potentially to be introduced for the 32nm node. Although it is likely that the implementation of this technology for semiconductor device manufacturing is still some years away, there are many challenges to overcome. The objective of the joint activity between TEL and IMEC on EUV lithography is to understand the nature of such challenges related to photoresist processing, and to identify potential solutions to these challenges.
As an extension of the current collaboration on immersion lithography, TEL will also install a state of the art CLEAN TRACK(TM) LITHIUS(TM) i+ system for Hyper NA 193nm Immersion Lithography in Q1/2006. This tool will feature technologies specific to immersion lithography developed as a result of defectivity work carried out by IMEC and TEL using the CLEAN TRACK ACT(TM)12 currently installed at IMEC. The LITHIUS I+ will be interfaced to IMEC's ASML XT1700i to form a world leading immersion lithography cluster.
This will bring the total number of TEL's CLEAN TRACK systems installed at IMEC's facilities in Leuven to nine. This significant install base represents the value that TEL places on working in collaboration with IMEC, as well as reflecting IMEC's status as a world leader in semiconductor technology research.
High expectations are placed on the combination of IMEC's advanced research capabilities and TEL's technological expertise on photoresist processing. TEL will apply knowledge gained on critical dimension and defectivity control for EUV processes to its products, enabling TEL to provide fit-for-purpose technology to customers in a timely manner.
*1 CLEAN TRACK is a registered trademark of Tokyo Electron Limited.
*2 LITHIUSi+ is a registered trademark of Tokyo Electron Limited.
*3 CLEAN TRACK ACT is a registered trademark of Tokyo Electron Limited.
TEL, established in 1963, is a leading supplier of innovative semiconductor and FPD production equipment worldwide. In Japan, TEL also distributes computer network related products and electronic components of global leading suppliers. To support this diverse product base, TEL is strategically located around the world. TEL is a publicly held company listed on the Tokyo Stock Exchange. www.tel.com
IMEC is a world-leading independent research center in nanoelectronics and nanotechnology. Its research focuses on the next generations of chips and systems, and on the enabling technologies for ambient intelligence. IMEC's research bridges the gap between fundamental research at universities and technology development in industry. Its unique balance of processing and system know-how, intellectual property portfolio, state-of-the-art infrastructure and its strong network of companies, universities and research institutes worldwide position IMEC as a key partner for shaping technologies for future systems. As an expansion of its wireless research, IMEC has created a legal entity in the Netherlands. Stichting IMEC Nederland runs activities at the Holst Centre, an independent R&D institute that develops generic technologies and technology platforms for autonomous wireless transducer solutions and systems-in-foil.
IMEC is headquartered in Leuven, Belgium, and has representatives in the US, China and Japan. Its staff of about 1400 people includes close to 500 industrial residents and guest researchers. In 2005, its revenues are estimated to be close to EUR 200 million. Further information on IMEC can be found on www.imec.be.