Applied Materials’ New Enabler E5 System Solves Critical Contact Etch
Challenges for 32nm Memory Chips
SANTA CLARA, Calif.--(BUSINESS WIRE)--Applied Materials, Inc. today unveiled its Applied Centura®
Enabler® E5 dielectric etch system, the
industry’s most advanced solution for creating the 40:1 high aspect
ratio contact features that are critical to the yield and performance of
32nm and below DRAM and Flash memory chips. The Enabler E5 sets a new
benchmark in profile control, enabling customers to manufacture high
performance, robust, next-generation memory devices with >80%
bottom-to-top CD ratios across the wafer, and with less than 3nm bowing
of the contact sidewall.
“Next-generation Flash and DRAM devices pose a significant challenge for
dielectric etch systems since it is very difficult to achieve the global
profile control necessary for fabricating high aspect ratio contacts,”
said Ellie Yieh, vice president and general manager of Applied
Materials’ Etch and Cleans Business Unit. “The Enabler E5 is the only
system that can meet all these requirements, allowing memory
manufacturers to continue to increase density and reduce the
cost-per-bit.”
“Customers are very excited about the Enabler E5 system’s exceptional
profile control,” added Ms. Yieh. “We’re seeing strong demand for this
product with multiple systems installed worldwide and repeat orders from
leading memory manufacturers where it has solidly won multiple
head-to-head run-offs with other systems.”
Central to the Enabler E5 system’s performance are its unique reactor
architecture and precise process control that provide repeatable,
uniform vertical profiles at high aspect ratios globally – from
edge-to-edge and wafer-to-wafer – addressing a critical yield inhibitor
at higher memory densities. The proprietary chamber technology also
provides more efficient cleaning, delivering 50% longer
between-maintenance intervals than any competitive system. For more
information on the Applied Centura Enabler E5 system, please visit: www.appliedmaterials.com/products/dielectric_etch_enabler_4.html.
Applied Materials, Inc. (Nasdaq:AMAT) is the global leader in
Nanomanufacturing Technology™ solutions with a broad portfolio of
innovative equipment, service and software products for the fabrication
of semiconductor chips, flat panel displays, solar photovoltaic cells,
flexible electronics and energy efficient glass. At Applied Materials,
we apply Nanomanufacturing Technology to improve the way people live.
Learn more at www.appliedmaterials.com.