Applied Materials’ UVision 3 Sets
Benchmark for Brightfield Inspection Sensitivity and Productivity
SANTA CLARA, Calif.--(BUSINESS WIRE)--Applied Materials, Inc. today unveiled its Applied UVision®
3 system, the industry’s highest productivity
DUV1 Brightfield wafer inspection tool with the
critical-defect detection sensitivity required for 45 nanometer (nm) FEOL2
and immersion lithography. Delivering significant advancements to Applied’s
breakthrough UVision technology, this next-generation system triples the
number of laser beams scanning the wafer to provide 40% faster
throughput than any competitive system. Two new imaging modes extend
sensitivity to 20nm, and a new flexible automatic defect classification
engine enables quick access to defects of interest and faster yield
learning.
“The UVision 3 system's multi-beam DUV laser
architecture allows extendibility beyond the resolution limits of
traditional optical inspection,” said Dr.
Gilad Almogy, vice president and general manager of Applied Materials'
Process Diagnostics and Control group. “With
this enhanced system, leading-edge memory and immersion lithography
manufacturers can run volume production at engineering tool sensitivity
with a shorter cycle time to generate meaningful data. We have shipped
multiple UVision 3 systems to leading customers where they have
validated its exceptional sensitivity at groundbreaking DUV Brightfield
throughputs.”
By coupling unique laser DUV architecture with a sensitive
photo-multiplier tube (PMT) and variable polarization, the UVision 3
system also meets the challenges of 32nm memory development. New
Brightfield imaging modes, both in the illumination and collection path,
address the contrast versatility required for immersion lithography. In
addition, the system’s innovative algorithms
of high defect accuracy and stitch-to-stitch detection enable enhanced
sensitivity on periphery areas, a key advantage not addressed by any
other Brightfield system.
UVision 3 is an integral part of Applied Material's advanced
lithography-enabling technologies for 45nm and below double patterning
and advanced FEOL applications. For more information on the Applied
UVision system, visit http://appliedmaterials.com/products/uvision_4.html.
Applied Materials, Inc. (Nasdaq:AMAT) is the global leader in
Nanomanufacturing Technology™ solutions with a
broad portfolio of innovative equipment, service and software products
for the fabrication of semiconductor chips, flat panel displays, solar
photovoltaic cells, flexible electronics and energy efficient glass. At
Applied Materials, we apply Nanomanufacturing Technology to improve the
way people live. Learn more at www.appliedmaterials.com.
1 DUV=deep ultraviolet
2 FEOL=front end of line
