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The Applied Centura(R) Tetra(TM) III Advanced Reticle Etch system delivers the vital nanomanufacturing technology required for etching 45nm photomasks. (Photo: Business Wire)

The Applied Centura(R) Tetra(TM) III Advanced Reticle Etch system delivers the vital nanomanufacturing technology required for etching 45nm photomasks. (Photo: Business Wire)

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http://www.businesswire.com/multimedia/appliedmaterials/20070417005395/en/1437758

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