Applied Materials' UVision SP Solves Defect Inspection Challenges for
Immersion Lithography at CNSE's Albany NanoTech
SANTA CLARA, Calif.--(BUSINESS WIRE)--Applied Materials, Inc. (Nasdaq:AMAT) today announced that its Applied
UVision®
SP brightfield inspection system has achieved a significant
breakthrough in resolving defect inspection challenges related to
immersion[1]
lithography at the College of Nanoscale Science and Engineering (CNSE)
of the University at Albany’s Albany
NanoTech complex. Using new variable laser polarization technology,
the UVision SP is the first system to capture critical 30nm immersion
lithography defects, including micro-bridges between dense structures.
“The comprehensive detection results provided
by the Applied UVision SP system allowed full characterization and
optimization of the immersion lithography process,”
said Dr. James G. Ryan, professor of nanoscience and associate vice
president of technology at CNSE. “The
knowledge gained from defectivity trends and root cause studies will be
extremely beneficial in advancing the cutting-edge research and
development being conducted at CNSE’s Albany
NanoTech complex by faculty, scientists and our growing complement of
global corporate partners.”
The Applied
UVision SP system’s DUV laser inspection
technology provides a unique advantage in detecting immersion
lithography-related defects. While the DUV wavelength suppresses noise
from previous layers, the laser brightness and high-sensitivity
photomultiplier array capture the weak defect signals typically found in
lithography layers. Variable laser polarization capability further
extends UVision’s sensitivity in finding small
defects on complex backgrounds. Visit http://www.appliedmaterials.com/products/resolution.html.
“We are excited to be part of the immersion
lithography program at the Albany NanoTech complex and are pleased with
the outstanding results obtained using the UVision SP system,”
said Dr. Gilad Almogy, vice president and general manager of Applied
Materials’ Process Diagnostics and Control
Group. “With the UVision SP, chipmakers can
now fully characterize their immersion lithography process and move
closer to implementing it in production.”
CNSE, the College of Nanoscale Science and Engineering of the
University at Albany-State Univ. of New York, is the first college in
the world devoted exclusively to the research, development and
deployment of innovative nanoscience, nanoengineering, nanobioscience
and nanoeconomics concepts. CNSE’s Albany
NanoTech complex has more than 250 U.S. and worldwide partners,
including some of the world’s largest
semiconductor and semiconductor-related tool manufacturing companies.
For more information, visit CNSE website at http://cnse.albany.edu.
Applied Materials, Inc. (Nasdaq:AMAT) is the global leader in
Nanomanufacturing Technology™ solutions with
a broad portfolio of innovative equipment, service and software products
for the fabrication of semiconductor chips, flat panels, solar
photovoltaic cells, flexible electronics and energy efficient glass. At
Applied Materials, we apply Nanomanufacturing Technology to improve the
way people live. Learn more at www.appliedmaterials.com.
[1]
Immersion: a chip patterning technique for extending 193nm
wavelength lithography methods.
