Metron Technology Delivers World-Class PFC Abatement Technology
SAN JOSE, Calif.--(
BUSINESS WIRE)--March 16, 2006--Metron Technology, Inc. today announced an expanded product line of world-class abatement technology for reducing PFC (perfluorocompound) emissions consisting of the Marathon(TM), Litmas(TM) and Trinity(TM) systems, part of the Metron EcoSys(R) family of abatement systems.(1) Marathon achieves high PFC treatment efficiencies for etch and CVD(2) emissions, with extremely low water flow rates. Trinity is a self-contained treatment system for etch emissions that offers low power consumption. Litmas, a non-fuel based plasma solution for etch, provides high-efficiency PFC abatement with zero added footprint.
"Metron is the only company that can provide semiconductor manufacturers with a unique and comprehensive suite of PFC abatement technologies plus global fab support capability," said Werner Finsterbusch, general manager of Metron Technology. "Our EcoSys line of abatement systems helps customers implement cost-effective solutions to support their environmental goals and commitments, while helping the industry meet the World Semiconductor Council's commitment to globally reduce PFC emissions by the year 2010."
“Our EcoSys line of abatement systems helps customers implement cost-effective solutions to support their environmental goals and commitments, while helping the industry meet the World Semiconductor Council's commitment to globally reduce PFC emissions by the year 2010.”
The Marathon system integrates combustion and wet scrubbing abatement technologies to handle high gas flows from semiconductor and flat panel display CVD manufacturing processes. With its high flow capacity, one Marathon system can be configured to handle two process tools per abatement unit, for low cost of ownership; two Marathon systems can be also configured to provide automatic back-up capability for two process tools.
The Trinity system, installed downstream of the process vacuum pumps, uses atmospheric pressure non-combustion, chemical catalytic technology and can handle up to four etch chambers simultaneously.
The Litmas system, installed in the fore-line between a process chamber and a vacuum pump, employs a low-pressure plasma technology to achieve excellent PFC abatement efficiency. With its low operating cost and no added footprint, it offers an efficient retrofit solution to treat PFC emissions from existing etch tools.
The Marathon system will be exhibited at the Semicon China 2006 trade show in Shanghai on March 21-23, 2006 in the Metron Technology booth 3343, Hall W3.
Metron Technology, Inc., a wholly-owned subsidiary of Applied Materials, Inc. (Nasdaq:AMAT), is an independent supplier of fab-wide support services to the semiconductor and related industries providing custom integrated solutions for optimizing operations and improving manufacturing efficiency. Metron is headquartered in San Jose, California, and is on the web at www.metrontech.com and www.emetron.com
(1) The Trinity and Litmas systems are made by Guild Associates, Inc. and Advanced Energy, Inc., respectively, for worldwide distribution by Metron Technology.
(2) chemical vapor deposition
