The global photomask inspection market to grow at a CAGR of 7.05% during the period 2017-2021.
The report, Global Photomask Inspection Market 2017-2021, has been prepared based on an in-depth market analysis with inputs from industry experts. The report covers the market landscape and its growth prospects over the coming years. The report also includes a discussion of the key vendors operating in this market.
One trend in the market is increase in wafer size. A wafer is known as a slice or substrate. It is a thin substrate of semiconductor material, such as crystalline silicon and is used for the fabrication of ICs and photovoltaics for conventional, wafer-based solar cells. Silicon wafers are essential for the fabrication of ICs.
According to the report, one driver in the market is growth of wireless computing devices. The growth of mobile computing devices has fueled the growth of the global photomask inspection market. Consumers electronics such as smartphones, laptops, and notebooks are in demand. They are becoming lighter, slimmer, and more reliable. They are the highest contributors to the revenue of the global photomask inspection market, which is expected to continue during the forecast period. The growing demand for consumer electronics is directly proportional to increase in the rate of adoption of photomask inspection.
- Applied Materials
Other prominent vendors
- Carl Zeiss
- FEI (a subsidiary of Thermo Fisher Scientific)
- Hermes Microvision
- Rudolph Technologies
Key Topics Covered:
PART 01: Executive summary
PART 02: Scope of the report
PART 03: Research Methodology
PART 04: Introduction
PART 05: Market landscape
PART 06: Market overview
PART 07: Market segmentation by technology type
PART 08: Market segmentation by end-user
PART 09: Geographical segmentation
PART 10: Key leading countries
PART 11: Market drivers
PART 12: Impact of drivers
PART 13: Market challenges
PART 14: Impact of drivers and challenges
PART 15: Market trends
PART 16: Vendor landscape
PART 17: Key vendor analysis
PART 18: Appendix
For more information about this report visit http://www.researchandmarkets.com/research/n3bfds/global_photomask