Nanometrics Wins Integrated Metrology Selection from Leading Japanese Semiconductor Company for New Fab Build-out

MILPITAS, Calif.--(BUSINESS WIRE)--Nanometrics Incorporated (NASDAQ:NANO), a leading provider of advanced process control metrology systems, today announced that a leading Japanese semiconductor company has selected its IMPULSE^® integrated metrology (IM) solution for process control of advanced chemical mechanical polishing (CMP) applications to be deployed as part of its new fab build-out. The selection expands on the recent order by the same customer for Nanometrics’ Lynx™ cluster metrology platform equipped with IMPULSE systems, which was selected for in-line optical critical dimension (OCD) control of etch and lithography applications.

“The IMPULSE system was selected for its superior measurement performance, reliability and speed. This selection is further evidence of the competitive gains we are making by working closely with industry-leading device manufacturers to align our product roadmaps to future technology requirements”

“The IMPULSE system was selected for its superior measurement performance, reliability and speed. This selection is further evidence of the competitive gains we are making by working closely with industry-leading device manufacturers to align our product roadmaps to future technology requirements,” commented Steve Bradley, Director of Nanometrics’ Integrated Metrology Business Unit. “The IMPULSE system is now qualified on the latest CMP platforms from the two leading suppliers of CMP systems, for both dielectric and metal polishing applications. Our integrated metrology solutions are utilized in leading logic, Flash, DRAM and foundry fabs, providing in-line metrology for lithography, etch, CMP and thin film deposition for device geometries from 65nm down to the 1x node.”

About Nanometrics

Nanometrics is a leading provider of advanced, high-performance process control metrology systems used primarily in the fabrication of semiconductors, high-brightness LEDs, data storage devices and solar photovoltaics. Nanometrics’ automated and integrated metrology systems measure critical dimensions, device structures, overlay registration, topography and various thin film properties, including film thickness as well as optical, electrical and material properties. The company’s process control solutions are deployed throughout the fabrication process, from front-end-of-line substrate manufacturing, to high-volume production of semiconductors and other devices, to advanced wafer-scale packaging applications. Nanometrics’ systems enable device manufacturers to improve yields, increase productivity and lower their manufacturing costs. The company maintains its headquarters in Milpitas, California, with sales and service offices worldwide. Nanometrics is traded on NASDAQ Global Select Market under the symbol NANO. Nanometrics’ website is http://www.nanometrics.com.

Forward Looking Statements

This press release contains forward-looking statements including, but not limited to, statements regarding the capabilities of the company’s metrology products and technological leadership. Although Nanometrics believes that the expectations reflected in the forward-looking statements are reasonable, expectations regarding product capabilities and future collaboration are subject to a number of risks, including changes in customer spending plans, worldwide economic conditions and the continued technological leadership of our products. For additional information and considerations regarding the risks faced by Nanometrics, see its annual report on Form 10-K for the year ended January 2, 2010 as filed with the Securities and Exchange Commission, as well as other periodic reports filed with the SEC from time to time. Nanometrics disclaims any obligation to update information contained in any forward-looking statement.